Qianqiu Ye

Title: Qianqiu Ye: Innovator in Chemical Mechanical Polishing

Introduction

Qianqiu Ye is a prominent inventor based in Wilmington, DE (US), known for his contributions to the field of chemical mechanical polishing. With a total of 6 patents to his name, Ye has made significant advancements in polishing compositions and slurries used in semiconductor manufacturing.

Latest Patents

One of Ye's latest patents is for a polymeric barrier removal polishing slurry. This aqueous slurry is designed for chemical mechanical polishing of semiconductor substrates that have copper interconnects. The formulation includes a range of components, such as oxidizing agents, abrasive particles, and complexing agents, ensuring effective removal of copper interconnects while maintaining a pH of at least 8. Another notable patent involves polishing compositions for noble metals, specifically targeting substrates containing platinum. This composition includes various abrasive particles and water-soluble organic additives that enhance the dispersion of abrasives and improve metal removal rates.

Career Highlights

Throughout his career, Qianqiu Ye has worked with several notable companies, including Rohm and Haas, Electronic Materials CMP Holdings, Inc., and Rodel Holdings, Inc. His work in these organizations has contributed to the development of innovative polishing solutions that are essential in the semiconductor industry.

Collaborations

Ye has collaborated with esteemed colleagues such as Terence M. Thomas and Qiuliang Luo, further enriching his research and development efforts in the field of polishing technologies.

Conclusion

Qianqiu Ye's innovative work in chemical mechanical polishing has significantly impacted the semiconductor industry. His patents reflect a deep understanding of materials and processes that enhance the efficiency and effectiveness of polishing techniques.