The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Feb. 02, 2001
Applicants:
Craig D. Lack, Wilmington, DE (US);
Terence M. Thomas, Newark, DE (US);
Qianqiu YE, Wilmington, DE (US);
Inventors:
Craig D. Lack, Wilmington, DE (US);
Terence M. Thomas, Newark, DE (US);
Qianqiu Ye, Wilmington, DE (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24B 7/19 (2006.01); B24B 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polishing composition to remove metal from a dielectric layer by, either single step CMP polishing, or two step CMP polishing, the composition including, an aqueous solution provided with a substance having molecules with respective silanols, and a concentration of ions that solublize the silanols to adsorb on a hydrated surface of the dielectric layer during said polishing.