Qiangmin Wei

Title: Qiangmin Wei: Innovator in Microscopy and Polysilicon Characterization

Introduction

Qiangmin Wei is a notable inventor based in Wuhan, China. He has made significant contributions to the fields of microscopy and polysilicon characterization. With a total of two patents to his name, Wei's work is recognized for its innovative approaches and practical applications.

Latest Patents

Wei's latest patents include a "Method for tilting characterization by microscopy." This method involves measuring a first tilting shift of structures based on their initial arrangement. The structures are oriented vertically on a horizontal plane of a product. A second tilting shift is then measured based on a horizontal flip of the first arrangement. The corrected tilting shift is determined by analyzing both tilting shifts. Another significant patent is for "Methods for polysilicon characterization." This method entails receiving image data of a polysilicon structure on a sample substrate, generated by transmission electron microscopy (TEM). It includes extracting the frequency spectrum of the image data and selecting a subset that corresponds to the characteristics of first crystal grains of a specific orientation.

Career Highlights

Qiangmin Wei is currently employed at Yangtze Memory Technologies Co., Ltd. His work at this company has allowed him to further develop his innovative methods and contribute to advancements in technology.

Collaborations

Wei collaborates with notable colleagues, including Jun Liu and Yu Li. Their teamwork enhances the research and development efforts within their field.

Conclusion

Qiangmin Wei's contributions to microscopy and polysilicon characterization demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving methods that have practical applications in various industries.