The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Oct. 20, 2021
Applicant:

Yangtze Memory Technologies Co., Ltd., Hubei, CN;

Inventors:

Jun Liu, Wuhan, CN;

Yu Li, Wuhan, CN;

Yi Li, Wuhan, CN;

Yingfei Wang, Wuhan, CN;

Shiyan Wu, Wuhan, CN;

Qiangmin Wei, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/36 (2006.01); G02B 21/16 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
G02B 21/367 (2013.01); G02B 21/16 (2013.01); H01J 37/261 (2013.01); H01J 2237/2802 (2013.01);
Abstract

Aspects of the disclosure provide a method of tilting characterization. The method includes measuring a first tilting shift of structures based on a first disposition of the structures. The structures are formed in a vertical direction on a horizontal plane of a product. A second tilting shift of the structures is measured based on a second disposition of the structures. The second disposition is a horizontal flip of the first disposition. A corrected tilting shift is determined based on the first tilting shift and the second tilting shift.


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