Qiang Shu

Title: Qiang Shu: Innovator in Semiconductor Technology

Introduction

Qiang Shu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on developing advanced mask patterns that enhance semiconductor structures.

Latest Patents

One of Qiang Shu's latest patents is a mask pattern designed for forming semiconductor structures. This innovative mask pattern consists of a first mask pattern and a second mask pattern. The first mask pattern includes multiple first target patterns arranged along a specific direction, while the second mask pattern contains several second target patterns aligned in the same direction. When these two mask patterns overlap, one of the first target patterns partially overlaps with a corresponding second target pattern. Another notable patent involves a mask pattern, a semiconductor structure, and a method for forming the semiconductor structure, which shares similar features to his previous work.

Career Highlights

Qiang Shu has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Qiang Shu has collaborated with talented professionals such as Qiang Wu and Jing'An Hao. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Qiang Shu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing and design.