Priyanka Dash

Title: The Innovative Journey of Priyanka Dash

Introduction

Priyanka Dash is a prominent inventor based in Menlo Park, CA (US). She has made significant contributions to the field of substrate processing and film deposition technologies. With a total of 4 patents to her name, her work has had a substantial impact on the industry.

Latest Patents

Priyanka's latest patents include groundbreaking technologies such as a "System and method for substrate processing chambers." This invention focuses on systems and methods for depositing a film in a PECVD chamber while reducing residue buildup. The processing chamber she describes includes a chamber body, a substrate support, a showerhead, and heaters designed to heat the showerhead. Additionally, she has developed a method titled "Interconnect integration for sidewall pore seal and via cleanliness." This method involves sealing porous low-k dielectric films by exposing a substrate to UV radiation and a reactive gas, selectively forming a pore sealing layer using UV-assisted photochemical vapor deposition.

Career Highlights

Throughout her career, Priyanka has worked with notable companies, including Applied Materials, Inc. Her experience in these organizations has allowed her to refine her skills and contribute to innovative projects in the semiconductor industry.

Collaborations

Priyanka has collaborated with esteemed colleagues such as Alexandros T Demos and Deenesh Padhi. These partnerships have further enhanced her research and development efforts.

Conclusion

Priyanka Dash's contributions to substrate processing and film deposition technologies exemplify her innovative spirit and dedication to advancing the field. Her patents reflect her expertise and commitment to solving complex challenges in the industry.