PO-Ching Su

Title: Innovations by PO-Ching Su in Semiconductor Technology

Introduction

PO-Ching Su is an accomplished inventor based in Tainan City, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

One of PO-Ching Su's notable patents is titled "Semiconductor structure and fabricating method of the same." This patent describes a semiconductor that includes a substrate, with a gate structure disposed on it. A liner oxide contacts a side of the gate structure, while a silicon oxide spacer contacts the liner oxide. An end of the silicon oxide spacer forms a kink profile. Additionally, a silicon nitride spacer contacts the silicon oxide spacer, and a tail of the silicon nitride spacer covers part of the kink profile. A stressor covers both the silicon nitride spacer and the substrate. This innovative design enhances the performance and reliability of semiconductor devices.

Career Highlights

PO-Ching Su is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to further develop his expertise and contribute to cutting-edge technologies.

Collaborations

Throughout his career, PO-Ching Su has collaborated with talented individuals such as Yi-Fan Li and Chen-Ming Wang. These collaborations have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

In summary, PO-Ching Su is a prominent inventor in the semiconductor field, with a patent that showcases his innovative approach to technology. His contributions continue to impact the industry positively.