Pei-Wen Wu

Title: Pei-Wen Wu: Innovator in Semiconductor Technology

Introduction

Pei-Wen Wu is a notable inventor based in Xinfeng, China. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving the efficiency and functionality of semiconductor devices.

Latest Patents

Wu's latest patents include innovative methods for forming transistor source/drain contacts. This method involves depositing an inter-layer dielectric over a source/drain region, forming a contact opening, and creating a metal-semiconductor alloy region. Additionally, he has developed a formation method for interconnection structures in semiconductor devices, which includes forming a dielectric layer and modifying conductive layers using plasma operations.

Career Highlights

Pei-Wen Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to advance semiconductor technology. His expertise in the field has led to the development of cutting-edge methods that enhance device performance.

Collaborations

Wu collaborates with talented colleagues, including Sung-Li Wang and Min-Hsiu Hung, who contribute to his innovative projects and research efforts.

Conclusion

Pei-Wen Wu's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor devices and their applications.