Pei Shan Chang

Title: Pei Shan Chang: Innovator in Semiconductor Technology

Introduction

Pei Shan Chang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Pei Shan Chang holds a patent titled "Contact features of semiconductor device and method of forming same." This patent describes a method that includes forming a dielectric layer over a source/drain region. An opening is created in the dielectric layer, exposing a portion of the source/drain region. A conductive liner is formed on the sidewalls and bottom of the opening. A surface modification process is performed on the exposed surface of the conductive liner, resulting in a surface coating layer. This layer is then removed to expose the conductive liner, which is subsequently removed from the sidewalls of the opening. Finally, the opening is filled with a conductive material in a bottom-up manner, ensuring that the conductive material is in physical contact with the remaining portion of the conductive liner and the dielectric layer.

Career Highlights

Pei Shan Chang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to advance his work in semiconductor technology. His expertise and innovative approach have positioned him as a valuable asset in the industry.

Collaborations

Some of his coworkers include Yi-Hsiang Chao and Chun-Hsien Huang, who contribute to the collaborative environment that fosters innovation and development in their projects.

Conclusion

Pei Shan Chang's contributions to semiconductor technology through his patent demonstrate his commitment to innovation in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of creativity and technical expertise in driving progress.