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For the Inventor, By the Inventor

Eindhoven, Netherlands

Pavel Potocek

This inventor holds 32 USPTO granted patents and 12 published patent applications and 12 EPO patents, primarily in Charged Particle Microscopy. Top assignees: Fei Comapny, Other. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pavel Potocek. Retrieved from https://idiyas.com/inventor/pavel-potocek

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 71(Granted Patents)


Company Filing History:

goldMedal31 out of 860 
 
Fei Comapny
 patents
silverMedal1 out of 834,453 
Other
 patents

Years Active: 2013-2026

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Areas of Expertise:
Charged Particle Microscopy
Image Reconstruction
Adaptive Acquisition
Neural Networks
Tomographic Imaging
Depth-Resolved Imagery
Machine Learning
Image Restoration
Specimen Analysis
Three-Dimensional Imaging
Data Processing
Simulation
32 patents (USPTO):Explore Patents
1. 12548732 - Application management for charged particle microscope devices (2026-02-10),
2. 12392735 - Sparse image reconstruction from neighboring tomography tilt images (2025-08-19),
3. 12288667 - Live-assisted image acquisition method and system with charged particle microscopy (2025-04-29),
4. 12136532 - Dual speed acquisition for drift corrected, fast, low dose, adaptive compositional charged particle imaging (2024-11-05),
5. 12085523 - Adaptive specimen image acquisition using an artificial neural network (2024-09-10),
6. 12002194 - Training an artificial neural network using simulated specimen images (2024-06-04),
7. 11982634 - Adaptive specimen image acquisition (2024-05-14),
8. 11861817 - Method implemented by a data processing apparatus, and charged particle beam device for inspecting a specimen using such a method (2024-01-02),
9. 11741730 - Charged particle microscope scan masking for three-dimensional reconstruction (2023-08-29),
10. 11488800 - Dual speed acquisition for drift corrected, fast, low dose, adaptive compositional charged particle imaging (2022-11-01),
11. 11482400 - Method, device and system for remote deep learning for microscopic image reconstruction and segmentation (2022-10-25),
12. 11380529 - Depth reconstruction for 3D images of samples in a charged particle system (2022-07-05),
13. 11355305 - Low keV ion beam image restoration by machine learning for object localization (2022-06-07),
14. 11282670 - Slice depth reconstruction of charged particle images using model simulation for improved generation of 3D sample images (2022-03-22),
15. 11100612 - Acquisition strategy for neural network based image restoration (2021-08-24),

Title: Inventor Pavel Potocek: Revolutionizing Technology in Eindhoven

Introduction: Pavel Potocek is a visionary inventor based in Eindhoven, NL, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Pavel Potocek holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a background in engineering and a passion for problem-solving, Pavel Potocek has led numerous successful projects that have pushed the boundaries of technological advancement. His innovative solutions have garnered recognition both locally and internationally.

Collaborations: Throughout his career, Pavel Potocek has collaborated with leading research institutions, universities, and tech companies to bring his ideas to life. His ability to work across disciplines and industries has led to the development of cutting-edge products and services.

Conclusion: Pavel Potocek's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs. His impact on the technological landscape in Eindhoven and beyond is truly remarkable.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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