The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

Jun. 24, 2021
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Pavel Potocek, Eindhoven, NL;

Maurice Peemen, Eindhoven, NL;

Bert Henning Freitag, Eindhoven, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/33 (2017.01); G06T 19/00 (2011.01); G06V 20/69 (2022.01); G06V 10/88 (2022.01);
U.S. Cl.
CPC ...
G06V 20/695 (2022.01); G06T 7/33 (2017.01); G06T 19/00 (2013.01); G06V 10/92 (2022.01); G06V 20/693 (2022.01); G06T 2207/10061 (2013.01);
Abstract

Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.


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