Pavan Kumar Perali

Title: Pavan Kumar Perali: Innovator in Plasma Inspection Technology

Introduction

Pavan Kumar Perali is a notable inventor based in San Ramon, CA (US). He has made significant contributions to the field of plasma inspection technology, holding a total of 4 patents. His work focuses on improving defect detection and design alignment in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Broad band plasma inspection based on a nuisance map." This innovation utilizes a noise map for defect detection, where measurements of intensities at various pixels are analyzed to determine intensity statistics. These statistics are then grouped into regions and stored alongside alignment targets, allowing for effective wafer inspection using the noise map as a segmentation mask to suppress noise. Another significant patent is "Target selection improvements for better design alignment." This patent discloses techniques and systems that enhance design alignment accuracy by improving pixel-to-design alignment (PDA) target selection. The PDA targets can be biased to include hotspot locations, and their uniqueness can be evaluated to identify repetitive patterns.

Career Highlights

Pavan Kumar Perali has worked with prominent companies in the semiconductor industry, including KLA-Tencor Corporation and KLA Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in plasma inspection technology.

Collaborations

Throughout his career, Pavan has collaborated with talented individuals such as Kaushik Reddy Vemareddy and Shishir Suman. These collaborations have contributed to the advancement of his research and innovations.

Conclusion

Pavan Kumar Perali is a distinguished inventor whose work in plasma inspection technology has led to significant advancements in the field. His patents reflect his commitment to improving semiconductor manufacturing processes, making him a valuable contributor to the industry.