Paul Kwok Keung Ho

This inventor holds 17 USPTO granted patents, primarily in Copper Semiconductor Processing. Top assignees: Chartered Semiconductor Manufacturing Ltd (Corporation), Chartered Semiconductor. Active years: 2001-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Kwok Keung Ho. Retrieved from https://idiyas.com/inventor/paul-kwok-keung-ho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 17

% Patents Active = 76.5

Average Co-Inventor Count = 5.6

ph-index = 7

Forward Citations = 234(Granted Patents)

Company Filing History:

16 out of 962

Chartered Semiconductor Manufacturing Ltd (Corporation)

patents

1 out of 2

Chartered Semiconductor

patents

Years Active: 2001-2006

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Areas of Expertise:

Copper Contamination

Semiconductor Cleaning

Dual Damascene

Copper Diffusion

Hydrogen Plasma

Metal Etching

Vapor Phase

Gettering Layer

Copper Seed Layer

Embedded Organic Stop Layer

Microloading Reduction

Contaminant Removal

17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6987321 - Copper diffusion deterrent interface (2006-01-17),

2. 6813796 - Apparatus and methods to clean copper contamination on wafer edge (2004-11-09),

3. 6720204 - Method of using hydrogen plasma to pre-clean copper surfaces during Cu/Cu or Cu/metal bonding (2004-04-13),

4. 6692579 - Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence (2004-02-17),

5. 6683002 - Method to create a copper diffusion deterrent interface (2004-01-27),

6. 6548413 - Method to reduce microloading in metal etching (2003-04-15),

7. 6540841 - Method and apparatus for removing contaminants from the perimeter of a semiconductor substrate (2003-04-01),

8. 6475810 - Method of manufacturing embedded organic stop layer for dual damascene patterning (2002-11-05),

9. 6429117 - Method to create copper traps by modifying treatment on the dielectrics surface (2002-08-06),

10. 6368958 - Method to deposit a cooper seed layer for dual damascence interconnects (2002-04-09),

11. 6358821 - Method of copper transport prevention by a sputtered gettering layer on backside of wafer (2002-03-19),

12. 6274499 - Method to avoid copper contamination during copper etching and CMP (2001-08-14),

13. 6261955 - Application of vapor phase HFACAC-based compound for use in copper decontamination and cleaning processes (2001-07-17),

14. 6261954 - Method to deposit a copper layer (2001-07-17),

15. 6251786 - Method to create a copper dual damascene structure with less dishing and erosion (2001-06-26),

Title: **Paul Kwok Keung Ho: Innovator in Semiconductor Technology**

Introduction

Paul Kwok Keung Ho is a prominent inventor based in Singapore, known for his significant contributions to semiconductor technology. With a portfolio that includes 17 patents, he has made remarkable strides in the field, creating innovative methods and products that enhance semiconductor manufacturing processes.

Latest Patents

Among his most recent patents are the following:

1. **Copper Diffusion Deterrent Interface** - This invention presents a method and product for forming a dual damascene interconnect structure. By depositing a copper sulfide interface layer as sidewalls to the openings, this invention effectively deters the migration or diffusion of copper ions into dielectric materials, significantly enhancing reliability.

2. **Apparatus and Methods to Clean Copper Contamination on Wafer Edge** - This innovative apparatus addresses the challenge of cleaning the outer edges of semiconductor substrates. The first embodiment features a brush mounted on the substrate's surface, which cleans the periphery while chemicals are fed through a hollow core. The substrate rotates at high speed, ensuring chemicals remain at the edge for optimal cleaning. The second embodiment introduces a porous roller that transfers chemicals to the cleaning surface, also maintaining them at the edges during high-speed rotation, leading to efficient cleaning results.

Career Highlights

Paul has had a distinguished career, notably working with Chartered Semiconductor Manufacturing Limited, where he played a pivotal role in advancing semiconductor technologies. His work has contributed significantly to the industry, making lasting impacts on the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Throughout his career, Paul has collaborated with esteemed professionals, including Mei Sheng Zhou and Subhash Gupta. These collaborations have enriched his work and fostered advancements in semiconductor innovations, pushing the boundaries of current technology.

Conclusion

Paul Kwok Keung Ho stands out as an influential inventor in the semiconductor industry. His impressive portfolio of patents and innovative contributions exemplifies his dedication to transforming the landscape of semiconductor manufacturing. As technology continues to evolve, his work remains a vital part of the ongoing advancement in this crucial field.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]