This inventor holds 3 USPTO granted patents and 2 EPO patents. Top assignees: Air Products and Chemicals, Inc., Tokyo Electron Limited. Active years: 2013-2015.
Company Filing History:
2 out of 3,217 
1 out of 10,837 
Years Active: 2013-2015
Title: Patrick Timothy Hurley: Innovator in Chemical Vapor Deposition
Introduction
Patrick Timothy Hurley is a notable inventor based in Allentown, PA (US). He has made significant contributions to the field of chemical vapor deposition, holding a total of 3 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of thin film deposition processes.
Latest Patents
One of Hurley's latest patents is a chemical vapor deposition method. This method involves depositing a thin film on a substrate surface by introducing a process gas that contains a chemical precursor. The gas is exposed to a non-ionizing heat source, which facilitates the decomposition of the precursor, resulting in a thin film being deposited on the substrate. Another significant patent is for antireflective coatings for photovoltaic applications. This process involves creating a silicon substrate with a p-n junction and forming an amorphous silicon carbide antireflective coating through chemical vapor deposition. The coating is represented by the formula SiCNHF, with specific atomic percentages for its components.
Career Highlights
Throughout his career, Patrick Timothy Hurley has worked with prominent companies such as Air Products and Chemicals, Inc. and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in the field of chemical vapor deposition and related technologies.
Collaborations
Hurley has collaborated with notable colleagues, including Raymond Nicholas Vrtis and Mark Leonard O'Neill. These partnerships have likely enriched his work and led to further advancements in his inventions.
Conclusion
Patrick Timothy Hurley is a distinguished inventor whose work in chemical vapor deposition has led to innovative patents that enhance thin film technology. His contributions continue to impact the field significantly.