The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Mar. 23, 2010
Eric M. Lee, Austin, TX (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Leonard O'neill, San Marcos, CA (US);
Patrick Timothy Hurley, Allentown, PA (US);
Jacques Faguet, Albany, NY (US);
Takashi Matsumoto, Tokyo, JP;
Osayuki Akiyama, Rensselaer, NY (US);
Eric M. Lee, Austin, TX (US);
Raymond Nicholas Vrtis, Orefield, PA (US);
Mark Leonard O'Neill, San Marcos, CA (US);
Patrick Timothy Hurley, Allentown, PA (US);
Jacques Faguet, Albany, NY (US);
Takashi Matsumoto, Tokyo, JP;
Osayuki Akiyama, Rensselaer, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A chemical vapor deposition (CVD) method for depositing a thin film on a surface of a substrate is described. The CVD method comprises disposing a substrate on a substrate holder in a process chamber, and introducing a process gas to the process chamber, wherein the process gas comprises a chemical precursor. The process gas is exposed to a non-ionizing heat source separate from the substrate holder to cause decomposition of the chemical precursor. A thin film is deposited upon the substrate.