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For the Inventor, By the Inventor

Tokyo, Japan

Osamu Nakamura

This inventor holds 37 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Image Processing. Top assignees: Kabushiki Kaisha Shinkawa, Dai Nippon Printing Co., Ltd., Kabushiki Kaisha Toshiba. Active years: 1983-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Nakamura. Retrieved from https://idiyas.com/inventor/osamu-nakamura-35e57kjp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 37 

% Patents Active = 94.6

 

Average Co-Inventor Count = 2.3

ph-index = 11

Forward Citations = 348(Granted Patents)


Location History:

  • Shizuoka, JP (1994)
  • Kokubunji, JP (1998 - 2001)
  • Tokyo-To, JP (2003)
  • Yokohama, JP (1995 - 2009)
  • Tokyo, JP (1983 - 2018)

Company Filing History:

goldMedal14 out of 349 
 
Kabushiki Kaisha Shinkawa
 patents
silverMedal4 out of 3,208 
 
Dai Nippon Printing Co., Ltd.
 patents
bronzeMedal4 out of 53,286 
 
Kabushiki Kaisha Toshiba
 patents
4. 3 out of 11,665 
 
Fuji Xerox Co., Ltd.
 patents
5. 3 out of 5 
 
Tsukamoto Seiki Co., Ltd.
 patents
6. 2 out of 1,160 
 
Minebea Company, Limited
 patents
7. 2 out of 176 
 
Nippon Chemi-Con Corporation
 patents
8. 1 out of 16 
 
Japan National Oil Corporation
 patents
9. 1 out of 7,659 
 
Renesas Electronics Corporation
 patents
10. 1 out of 16 
 
Secom Co., Ltd.
 patents
11. 1 out of 220 
 
Toa Nenryo Kogyo Kabushiki Kaisha
 patents
12. 1 out of 39 
 
Toa Nenryo Kogyo, K. K.
 patents

Years Active: 1983-2018

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Areas of Expertise:
Image Processing LSI
Electrolytic Capacitor
Permanent-Magnet Stepping Motor
Polarizable Electrode
Document Management
Wire-Bonding Apparatus
Die Bonding
Aperture Grill
Superconducting Films
Crest Line Detection
Rotary Drill Bit
Pressure Compensator
37 patents (USPTO):Explore Patents
1. 10096135 - Image processing LSI and image processing program (2018-10-09),
2. 9627145 - Electrolytic capacitor for use in a charge/discharge circuit with shorter period and greater voltage difference (2017-04-18),
3. 8896164 - Permanent-magnet stepping motor (2014-11-25),
4. 8274780 - Polarizable electrode for electric double layer capacitor and electric double layer capacitor using the same (2012-09-25),
5. 7627765 - Document management apparatus and document management method, and storage medium storing program (2009-12-01),
6. 6637528 - Bit apparatus (2003-10-28),
7. 6502757 - Information recorded medium, device for reading the information, information recorded medium transfer foil, and method for producing information recorded medium (2003-01-07),
8. 6447355 - Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region (2002-09-10),
9. 6304024 - Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region (2001-10-16),
10. 6244493 - Die bonding apparatus (2001-06-12),
11. 6034469 - Impregnated type cathode assembly, cathode substrate for use in the (2000-03-07),
12. 5897049 - Method for wire-bonding a covered wire (1999-04-27),
13. 5891796 - Method for wire-bonding a covered wire (1999-04-06),
14. 5853532 - Wafer ring supply and return device (1998-12-29),
15. 5824185 - Wafer ring supply and return device (1998-10-20),

Title: The Innovative Journey of Osamu Nakamura: A Pioneer in Image Processing and Electrolytic Capacitors

Introduction: Osamu Nakamura is a renowned inventor based in Tokyo, Japan, who has made significant contributions to the field of image processing and capacitor technology. With a remarkable portfolio of 37 patents, his inventions demonstrate a commitment to advancing technology and enhancing efficiency.

Latest Patents: Two of his latest patented innovations include an image processing LSI and an electrolytic capacitor design. The image processing LSI patent outlines a method for calculating display data for graphics computations, allowing for reduced RAM storage capacity by segmenting frames into multiple drawing areas while optimizing the use of work areas for storing intermediate data. The electrolytic capacitor patent describes a unique design that improves charge/discharge characteristics by optimizing the anode and cathode foil configuration and surface treatment, allowing for effective performance in charge/discharge circuits with shorter periods and greater voltage differences.

Career Highlights: Osamu Nakamura has an impressive career trajectory, having worked with notable companies such as Kabushiki Kaisha Shinkawa and Dai Nippon Printing Co., Ltd. His work in these organizations has significantly influenced the development and refinement of technologies in his areas of expertise.

Collaborations: Throughout his career, Nakamura collaborated with esteemed colleagues, including Kazumasa Sasakura and Tsuneharu Arai. These partnerships have played a vital role in fostering innovation and contributing to groundbreaking inventions in the field.

Conclusion: Osamu Nakamura's prolific contributions to technology, particularly through his latest patents in image processing and electrolytic capacitor design, showcase his dedication to innovation. As a prominent figure in his industry, Nakamura continues to inspire future generations of inventors and engineers by pushing the boundaries of what is possible in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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