Tosu, Japan

Osamu Kuroda

This inventor holds 23 USPTO granted patents and 1 published patent application, primarily in Substrate Processing. Top assignee: Tokyo Electron Limited. Active years: 2000-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Kuroda. Retrieved from https://idiyas.com/inventor/osamu-kuroda-kkc5drl3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 56.5

Average Co-Inventor Count = 2.3

ph-index = 11

Forward Citations = 281(Granted Patents)


Location History:

  • Tosu, JP (2000 - 2011)
  • Kumamoto, JP (2012 - 2015)
  • Koshi, JP (2023 - 2024)

Company Filing History:


Years Active: 2000-2024

Loading Chart...
Areas of Expertise:
Substrate Processing
Liquid Processing
Apparatus Cleaning
Treatment Method
Positioning Device
Wafer Processing
Storage Medium
Transporting Substrates
Concentration Method
Processing Apparatus
Substrate Positioning
Substrate Transporting
23 patents (USPTO):Explore Patents

Title: Osamu Kuroda: Innovator in Substrate Processing Technologies

Introduction

Osamu Kuroda, a distinguished inventor based in Tosu, Japan, has made significant contributions to the field of substrate processing. With an impressive portfolio of 23 patents, Kuroda has been instrumental in developing advanced technologies that streamline and enhance substrate processing methods.

Latest Patents

Among his latest inventions are two notable patents that focus on substrate processing apparatus and methods for cleaning these apparatus. The first patent, titled "Substrate Processing Apparatus and Apparatus Cleaning Method," describes a sophisticated system that includes a processing tub designed to accommodate multiple substrates and a liquid recovery unit that manages processing liquid overflow. This innovative setup ensures efficient processing and minimizes waste.

The second patent, "Substrate Liquid Processing Apparatus," outlines a system that regulates and drains processing liquids effectively. This apparatus features a processing liquid storage unit, a processing liquid drain unit, and a control unit that operates in both constant concentration and changing concentration modes. Such innovations are critical for maintaining optimal conditions in substrate processing tasks.

Career Highlights

Osamu Kuroda is currently affiliated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industries. His work at this organization has allowed him to tap into the latest technology and collaborate on influential projects that push the boundaries of substrate processing.

Collaborations

Throughout his career, Kuroda has collaborated with talented colleagues, including Tatsuya Nishida and Takehiko Orii. These collaborations highlight the importance of teamwork in his innovative endeavors, contributing to the successful development of groundbreaking technologies in substrate processing.

Conclusion

With a strong foundation in substrate processing technologies and an impressive number of patents to his name, Osamu Kuroda continues to be a leading figure in his field. His work at Tokyo Electron Limited and collaborations with skilled coworkers further exemplify his commitment to innovation and excellence in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…