The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Dec. 12, 2019
Tokyo Electron Limited, Tokyo, JP;
Teruaki Konishi, Koshi, JP;
Kouzou Kanagawa, Koshi, JP;
Osamu Kuroda, Koshi, JP;
Koji Tanaka, Koshi, JP;
Kotaro Tsurusaki, Koshi, JP;
Hidemasa Aratake, Koshi, JP;
Kouji Ogura, Koshi, JP;
Keita Hirase, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a substrate processing apparatus including: a processing part configured to process a substrate with a processing liquid; and a processing liquid generation part configured to generate the processing liquid supplied to the processing part. The processing liquid generation part includes: a reservoir configured to store the processing liquid; a circulation line through which the processing liquid stored in the reservoir is circulated; a heater configured to heat the processing liquid; and a nozzle provided at a downstream side of the circulation line and has at least one ejection port formed to eject the processing liquid heated by the heater from above a liquid level of the processing liquid stored in the reservoir.