This inventor holds 4 USPTO granted patents. Top assignee: H.c. Starck Gmbh. Active years: 2012-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2012-2017
Title: **Olaf Schmidt-Park: Innovator in Sputtering Technologies**
Introduction
Olaf Schmidt-Park, an accomplished inventor based in Needham, MA, has made significant contributions to the field of sputtering technologies. With a portfolio of four patents, his work centers around the creation and enhancement of metallic thin films, which are crucial for various high-tech applications.
Latest Patents
His latest patents include innovative methodologies for producing fine-grained, non-banded, refractory metal sputtering targets with a uniformly random crystallographic orientation. The patents detail a method for creating thin film based devices using sputtering targets that are rejuvenated through techniques such as cold spray. One notable patent outlines a process where a sputtering target, originally formed by ingot or powder metallurgy, undergoes rejuvenation by spray-depositing a metal powder within a recessed furrow. This results in a new layer with finer grain size and a more random crystalline microstructure, establishing a clear boundary between the rejuvenated layer and the sputtering material.
Career Highlights
Olaf Schmidt-Park's career is marked by his innovative approaches to sputtering technologies, primarily through his work with H.C. Starck GmbH. His patents not only reflect his technical expertise but also his commitment to advancing the capabilities of thin-film technologies in various industries.
Collaborations
Throughout his career, Olaf has collaborated with talented colleagues, including Steven Alfred Miller and Prabhat Kumar. These partnerships have fostered an environment of creativity and innovation, allowing for the development of advanced techniques in metallurgical processes and applications.
Conclusion
Olaf Schmidt-Park stands out as a leading inventor in the realm of sputtering technologies. His significant contributions and the patents he has secured demonstrate a dedication to pushing boundaries in the field of thin films. His ongoing work at H.C. Starck GmbH continues to influence the future of this essential technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile