The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Nov. 08, 2007
Applicants:
Steven A. Miller, Canton, MA (US);
Olaf Schmidt-park, Needham, MA (US);
Prabhat Kumar, Framingham, MA (US);
Richard Wu, Chelmsford, MA (US);
Shuwei Sun, Framingham, MA (US);
Stefan Zimmermann, Laufenburg, DE;
Inventors:
Steven A. Miller, Canton, MA (US);
Olaf Schmidt-Park, Needham, MA (US);
Prabhat Kumar, Framingham, MA (US);
Richard Wu, Chelmsford, MA (US);
Shuwei Sun, Framingham, MA (US);
Stefan Zimmermann, Laufenburg, DE;
Assignees:
H.C. Starck GmbH, Golsar, DE;
H.C. Starck Inc., Newton, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
In various embodiments, sputter-target formation includes application of a layer having an intermediate coefficient of thermal expansion between the backing plate and the target material.