Ofer Bokobza

Title: Ofer Bokobza: Innovator in Lithography Defect Categorization

Introduction

Ofer Bokobza is a notable inventor based in Cupertino, CA, who has made significant contributions to the field of lithography. With a total of 3 patents, his work focuses on methods and apparatus for categorizing defects in semiconductor manufacturing processes.

Latest Patents

Bokobza's latest patents include a design-based method for grouping systematic defects in lithography pattern writing systems. This innovation provides methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks. By analyzing the layout in the neighborhood of the defect and matching it to similar defected neighborhoods across the die, defects can be categorized by common structures in which they occur. Another significant patent involves grouping systematic defects with feedback from electrical inspection, further enhancing the categorization process for defects in semiconductor manufacturing.

Career Highlights

Throughout his career, Ofer Bokobza has worked with prominent companies in the semiconductor industry, including Applied Materials, Inc. and Applied Materials Israel Limited. His experience in these organizations has allowed him to develop and refine his innovative approaches to defect categorization.

Collaborations

Bokobza has collaborated with notable colleagues such as Youval Nehmadi and Ariel Ben-Porath, contributing to advancements in the field of lithography and semiconductor manufacturing.

Conclusion

Ofer Bokobza's contributions to the field of lithography through his innovative patents and collaborations highlight his role as a key inventor in semiconductor technology. His work continues to influence the industry and improve manufacturing processes.