The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2010

Filed:

Oct. 27, 2006
Applicants:

Jacob J. Orbon, Morgan Hill, CA (US);

Youval Nehmadi, Sunnyvale, CA (US);

Ofer Bokobza, Cupertino, CA (US);

Ariel Ben-porath, Gealya, IL;

Erez Ravid, Sunnyvale, CA (US);

Rinat Shimshi, San Jose, CA (US);

Vicky Svidenko, Sunnyvale, CA (US);

Inventors:

Jacob J. Orbon, Morgan Hill, CA (US);

Youval Nehmadi, Sunnyvale, CA (US);

Ofer Bokobza, Cupertino, CA (US);

Ariel Ben-Porath, Gealya, IL;

Erez Ravid, Sunnyvale, CA (US);

Rinat Shimshi, San Jose, CA (US);

Vicky Svidenko, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks used in lithographically writing patterns into such wafers are provided. For some embodiments, by analyzing the layout in the neighborhood of the defect, and matching it to similar defected neighborhoods in different locations across the die, defects may be categorized by common structures in which they occur.


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