Osaka, Japan

Noriyuki Matsubara

USPTO Granted Patents = 32 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Yamanashi, JP (2021)
  • Osaka, JP (2016 - 2022)

Company Filing History:


Years Active: 2016-2022

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32 patents (USPTO):Explore Patents

Title: Noriyuki Matsubara - Innovator in Plasma Processing Technology

Introduction

Noriyuki Matsubara is a prominent inventor based in Osaka, Japan, recognized for his contributions to plasma processing technology. With a remarkable portfolio of 32 patents, Matsubara continues to advance the field through innovative approaches and methods.

Latest Patents

Matsubara's recent inventions include a "Plasma Processing Apparatus and Plasma Processing Method." This apparatus is designed to perform plasma processing on substrates using a transport carrier. The innovative features encompass a transport mechanism, a position measuring section, and a control section that ensures accurate alignment between the plasma processing stage and the substrate based on real-time measurements.

Another notable patent is the "Element Chip Manufacturing Method," which outlines a comprehensive approach for manufacturing element chips. This method includes steps such as preparing a conveying carrier, preprocessing the substrate, and conducting plasma exposure to create multiple element chips efficiently.

Career Highlights

Noriyuki Matsubara works at Panasonic Intellectual Property Management Co., Ltd., where his expertise in plasma processing plays a crucial role in enhancing the company’s technological advancements. His dedication to research and innovation has resulted in numerous patents that reflect his ability to solve complex problems in semiconductor manufacturing.

Collaborations

Throughout his career, Matsubara has collaborated with other talented professionals, including Atsushi Harikai and Shogo Okita. Their combined efforts in research and development have led to significant breakthroughs in plasma processing techniques, fostering a collaborative environment in innovation.

Conclusion

Noriyuki Matsubara's work in plasma processing technology not only showcases his inventiveness but also highlights the importance of collaboration in the advancement of technology. His extensive patent portfolio underlines his commitment to innovation and his contribution to the field will undoubtedly impact future developments in semiconductor manufacturing.

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