The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Nov. 27, 2017
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Shogo Okita, Hyogo, JP;

Atsushi Harikai, Osaka, JP;

Noriyuki Matsubara, Osaka, JP;

Akihiro Itou, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/311 (2006.01); H01L 21/78 (2006.01); H01L 21/304 (2006.01); H01L 23/00 (2006.01); H01J 37/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6836 (2013.01); H01J 37/00 (2013.01); H01L 21/304 (2013.01); H01L 21/31138 (2013.01); H01L 21/78 (2013.01); H01L 24/95 (2013.01); H01L 21/67069 (2013.01); H01L 21/67109 (2013.01); H01L 24/13 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68336 (2013.01); H01L 2224/95001 (2013.01);
Abstract

Provided is a method of manufacturing a semiconductor chip, the method comprising: preparing a plurality of semiconductor chips, each of which has a surface to which a BG tape is stuck, and a rear surface to which a DAF is stuck, and which are held spaced from each other by the BG tape and the DAF, exposing the DAF between semiconductor chips that are adjacent to each other when viewed from the surface side, by stripping the BG tape from the surface of each of the plurality of semiconductor chips, etching the DAF that is exposed between the semiconductor chips that are adjacent to each other, by irradiating the plurality of semiconductor chips held on the DAF, with plasma.


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