Norio Uchihira

Title: Norio Uchihira: Innovator in Substrate Cleaning Technology

Introduction

Norio Uchihira is a prominent inventor based in Kumamoto-ken, Japan. He has made significant contributions to the field of substrate cleaning technology, holding a total of 4 patents. His innovative designs focus on improving the efficiency and effectiveness of cleaning processes for substrates used in various applications.

Latest Patents

Uchihira's latest patents include a substrate cleaning unit and a treatment device. The substrate cleaning unit features a holding mechanism that allows for rotatable and horizontal positioning of the substrate. It incorporates a first traveling means that moves a cleaning mechanism in parallel with the substrate, ensuring thorough cleaning. Additionally, the second traveling means supplies different types of processing solutions, enhancing the cleaning process. The treatment device is designed to hold substrates, such as LCD substrates, and supply treatment solutions while minimizing static electricity issues. This is achieved through a substrate-placing portion made of synthetic resinous material, which reduces electric charge and prevents electrostatic destruction of devices formed on the substrate.

Career Highlights

Uchihira is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has significantly advanced the technology used in substrate cleaning, making processes more efficient and reliable.

Collaborations

Uchihira has collaborated with notable coworkers, including Hiroshi Hashimoto and Kiyohisa Tateyama. Their combined expertise has contributed to the development of innovative solutions in substrate cleaning technology.

Conclusion

Norio Uchihira's contributions to substrate cleaning technology have established him as a key figure in the field. His innovative patents and collaborations continue to influence advancements in the industry.