Location History:
- Nara, JP (2005)
- Yamatokouriyama, JP (2003 - 2008)
Company Filing History:
3 out of 4,281 
2 out of 2 
1 out of 832,891 Years Active: 2003-2008
Title: Norio Maeda: Innovator in Substrate Drying Technologies
Introduction
Norio Maeda is a notable inventor based in Yamatokouriyama, Japan. He has made significant contributions to the field of substrate drying technologies, holding a total of 4 patents. His innovative approaches have advanced the efficiency and effectiveness of drying processes in various applications.
Latest Patents
Maeda's latest patents include a method and device for drying substrates. This device features a processing vessel that houses a specified number of substrates, such as semiconductor wafers, installed in parallel. It includes a first substrate supporting member, a processing fluid supplying section, and a processing fluid exhausting section. Additionally, it has a drying fluid supplying section that introduces liquid drops of drying fluid for effective drying processing on the substrates. Another patent focuses on a device that stores multiple substrates and comprises a processing container for draining cleaning fluid after substrate cleaning. This design simplifies the exhaust equipment and ensures smooth feeding of the drying fluid.
Career Highlights
Throughout his career, Norio Maeda has worked with prominent companies, including Daikin Industries, Ltd. and Toho Kasei Ltd. His experience in these organizations has contributed to his expertise in developing innovative drying technologies.
Collaborations
Maeda has collaborated with notable individuals in his field, including Hiroshi Aihara and Masao Oono. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Norio Maeda's contributions to substrate drying technologies exemplify his commitment to innovation. His patents and career achievements reflect his expertise and dedication to advancing the field.