The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
May. 15, 2003
Takazo Sotojima, Osaka, JP;
Norio Maeda, Nara, JP;
Takazo Sotojima, Osaka, JP;
Norio Maeda, Nara, JP;
Toho Kasei, Ltd, Nara, JP;
Daikin Industries, Ltd., Osaka, JP;
Abstract
The substrate drying apparatus has a substrate processing vessel, a substrate supporting section for supporting plural substratesin a standing condition and lined up condition in the interior of the substrate processing vessel, fluid reservoir sectionfor drying provided at an upward predetermined position of the substrate processing vessel, a first inert gas supplying sectionfor blowing inert gas against the drying fluidpooled in the fluid reservoir sectionfor drying so as to generate droplet of the drying fluid, and for guiding the droplet towards the center of the substrate processing vessel, and a second inert gas supplying sectionfor supplying inert gas vertically and downwardly so as to supply the generated droplet of the drying fluid towards the substrates, consequently safety is improved without providing special safety device, and sufficient amount of drying fluid is supplied to the dipping boundary face of the substrate and the cleaning liquid.