Fujisawa, Japan

Norihiko Nomura

This inventor holds 10 USPTO granted patents and 1 EPO patent. Top assignees: Ebara Corporation, Ckd Corporation. Active years: 2000-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiko Nomura. Retrieved from https://idiyas.com/inventor/norihiko-nomura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 90.0


Average Co-Inventor Count = 2.4

ph-index = 5

Forward Citations = 60(Granted Patents)


Location History:

  • Tokyo, JP (2002)
  • Fujisawa, JP (2000 - 2009)

Company Filing History:


Years Active: 2000-2009

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10 patents (USPTO):Explore Patents

Title: The Innovative Journey of Norihiko Nomura

Introduction: Norihiko Nomura, a pioneering inventor hailing from Fujisawa, Japan, has made significant contributions to the world of innovations with his groundbreaking ideas and inventions.

Latest Patents: Norihiko Nomura holds several patents in various fields, showcasing his diverse range of expertise and creativity in inventing new solutions to existing problems.

Career Highlights: Throughout his illustrious career, Nomura has consistently pushed the boundaries of what is possible, with a keen focus on improving the lives of people through his inventions. His dedication to innovation has led to the development of cutting-edge technologies that have revolutionized industries.

Collaborations: Nomura has collaborated with leading research institutions, universities, and companies to further his research and bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Norihiko Nomura's passion for innovation, coupled with his relentless drive to create, has established him as a prominent figure in the world of inventors. His contributions have not only shaped industries but have also inspired future generations to pursue their own inventive endeavors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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