Noriaki Toyoda

Title: Noriaki Toyoda: Innovator in Etching Technology

Introduction

Noriaki Toyoda is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the field of etching technology, holding a total of 4 patents. His innovative approaches have advanced the methods used in semiconductor manufacturing and other related industries.

Latest Patents

Toyoda's latest patents include an etching method, an etching apparatus, and a storage medium. The etching method for anisotropically etching a Cu film on a substrate surface involves providing a substrate with a Cu film in a chamber. An organic compound is supplied into the chamber while maintaining a vacuum state, and an oxygen gas cluster ion beam is irradiated onto the Cu film. This method further oxidizes the Cu film to a copper oxide using oxygen gas cluster ions, allowing for the anisotropic etching of the Cu film through a reaction with the organic compound. Additionally, he has developed a charged particle separation apparatus that separates ionized gas clusters. This apparatus includes an electric field applying part with two electrodes that generate an electric field to deflect the trajectory of the ionized gas cluster.

Career Highlights

Throughout his career, Noriaki Toyoda has worked with notable companies such as Tokyo Electron Limited and Hyogo Prefecture. His work has been instrumental in enhancing the efficiency and effectiveness of etching processes in various applications.

Collaborations

Toyoda has collaborated with esteemed colleagues, including Isao Yamada and Jiro Matsuo. Their combined expertise has contributed to the advancement of technologies in their respective fields.

Conclusion

Noriaki Toyoda's innovative contributions to etching technology and his collaborations with industry professionals highlight his significant impact on the field. His patents continue to influence advancements in semiconductor manufacturing and related technologies.