Saint Paul, MN, United States of America

Noel P Hoilien

This inventor holds 8 USPTO granted patents and 1 EPO patent. Top assignees: Polar Semiconductor, Inc., Allegro Microsystems, LLC. Active years: 2006-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noel P Hoilien. Retrieved from https://idiyas.com/inventor/noel-p-hoilien

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 87.5


Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Saint Paul, MN (US) (2006)
  • Minneapolis, MN (US) (2013 - 2024)

Company Filing History:


Years Active: 2006-2024

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8 patents (USPTO):Explore Patents

Title: The Innovations of Noel P. Hoilien

Introduction

Noel P. Hoilien is a prominent inventor based in Saint Paul, MN (US), known for his significant contributions to the field of semiconductor technology. With a total of eight patents to his name, Hoilien has made remarkable advancements in transistor design and fabrication methods. His work has had a lasting impact on the industry, particularly in enhancing the performance and efficiency of electronic devices.

Latest Patents

Hoilien's latest patents include innovative designs such as a transistor with a single termination trench having a depth of more than 10 microns. This patent outlines a method of fabricating a transistor that involves depositing a first epitaxial layer, followed by a second epitaxial layer. The process includes forming a single termination trench in the second layer and filling it with a dielectric material. The depth of this trench exceeds 10 microns, which is a significant advancement in transistor technology. Another notable patent is for an insulated gate bipolar transistor with an epitaxial layer formed on a recombination region. This invention details a method that includes implanting ions into a portion of the second epitaxial layer to create a recombination region, followed by the deposition of an n-type dopant layer.

Career Highlights

Throughout his career, Hoilien has worked with leading companies in the semiconductor industry, including Polar Semiconductor, Inc. and Allegro Microsystems, LLC. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies that push the boundaries of electronic components.

Collaborations

Hoilien has collaborated with notable professionals in the field, including Steven L. Kosier and John Charles Beckman. These partnerships have fostered an environment of innovation and creativity, leading to the development of advanced semiconductor technologies.

Conclusion

Noel P. Hoilien's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence the industry, paving the way for future advancements in electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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