Company Filing History:
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Years Active: 1992-2006
Title: **Nobuyuki Iriki: Innovator in Micropattern Measurement Technologies**
Introduction
Nobuyuki Iriki is a distinguished inventor based in Kodaira, Japan, known for his significant contributions to the field of semiconductor technology. With a portfolio of seven patents, Iriki has developed innovative solutions for measuring micropatterns in semiconductor devices, enhancing precision in manufacturing processes.
Latest Patents
One of Iriki's notable inventions is a **micropattern shape measuring system and method**. This invention involves a sophisticated technique where a test pattern formed in a scribe line area of a wafer is irradiated with a light beam for width measurement. Following this, an electron beam is used to further assess the width of the test pattern. By calculating changes in this width, the method estimates the shape of the micropattern without altering its dimensions. The system ultimately enables precise measurement of patterns in semiconductor devices, ensuring quality and accuracy in production.
Career Highlights
Throughout his career, Nobuyuki Iriki has worked with esteemed companies, including Hitachi, Ltd. and Hitachi High-Technologies Corporation. His roles in these organizations have allowed him to harness his expertise in technology and innovation, contributing to advancements in semiconductor measurement techniques.
Collaborations
During his professional journey, Iriki collaborated with talented individuals such as Susumu Komoriya and Takao Kawanabe. These collaborations have been instrumental in driving technological advancements and fostering a dynamic research environment.
Conclusion
Nobuyuki Iriki's contributions to the field of micropattern measurement have underscored his innovative spirit and technical expertise. With a proven track record of patents and collaborations with industry professionals, Iriki continues to influence the landscape of semiconductor fabrication technologies. His work not only reflects his dedication to innovation but also enhances the efficiency and accuracy of modern semiconductor manufacturing processes.