The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
Dec. 26, 2001
Nobuyuki Iriki, Kodaira, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
The efficiency is improved for a lithography step in a process of manufacturing semiconductor integrated circuits. For each semiconductor wafer, the method has a step of depositing a photosensitive organic film, a step of performing exposure processing, a step of performing development processing, a step of conducting a test, and a consistent processing step for removing the photosensitive organic film of a semiconductor wafer determined as nonstandard in the test in the processing unit for depositing the photosensitive organic film, and returning again to the step of depositing the photosensitive organic film to regenerate the semiconductor wafer. During the regeneration processing for the semiconductor wafer, other processing is automatically performed in parallel for other semiconductor wafers of the plurality of semiconductor wafers in a system for performing the consistent processing.