Yokohama, Japan

Nobuyuki Akiyama

This inventor holds 27 USPTO granted patents, primarily in Surface Inspection Technology. Top assignees: Hitachi, Ltd., Hitachi Metals, Ltd., Hitachi Electronics Engineering Co., Ltd.. Active years: 1978-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Akiyama. Retrieved from https://idiyas.com/inventor/nobuyuki-akiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 17

Forward Citations = 882(Granted Patents)


Location History:

  • Yokohama, JA (1978)
  • Yokohama, JP (1978 - 1994)

Company Filing History:


Years Active: 1978-1994

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Areas of Expertise:
Thin Film Multilayer Substrate
Reticle Inspection
Foreign Matter Detection
Surface Flaw Detection
Pattern Detection
Wafer Transformation
Flatness Measurement
X-Ray Exposure
Mask Alignment
Optical Magnification
Contaminant Detection
Defect Inspection
27 patents (USPTO):Explore Patents

Title: **Nobuyuki Akiyama: Pioneer in Thin Film Technologies**

Introduction

Nobuyuki Akiyama, based in Yokohama, Japan, is a notable inventor with a remarkable portfolio of 27 patents. His work primarily focuses on advanced techniques in thin film multilayer substrates, contributing significantly to modern electronics and semiconductor manufacturing.

Latest Patents

Akiyama's innovative contributions include two significant patents. The first is a **Method for Producing Thin Film Multilayer Substrate**, which outlines a process for producing substrates with multiple conductor pattern layers. This method employs optical detection to monitor the quality of conductor pattern layers during production, ensuring any faults can be promptly identified and repaired. This advancement enhances the production yield of thin film substrates that are crucial for mounting LSI (Large Scale Integration) chips, especially when high production costs are involved.

The second patent, **Method of Inspecting Reticles and Apparatus Therefor**, describes an advanced inspection apparatus for reticles used in lithography. This innovation includes mechanisms for holding and transferring reticles, coherent light illumination, and objective lenses to analyze transmitted or reflected light. By comparing the electric signals obtained from the inspected reticle with those from a standard reticle, this method effectively detects defects and foreign substances, ensuring higher quality control in semiconductor manufacturing.

Career Highlights

Throughout his career, Nobuyuki Akiyama has worked with prestigious companies, including Hitachi, Ltd. and Hitachi Metals, Ltd. His experience in these leading corporations has played a vital role in shaping his expertise in the field of thin film technology and semiconductor processes.

Collaborations

Akiyama has collaborated with fellow experts in his field, including Mitsuyoshi Koizumi and Asahiro Kuni. These collaborations have further propelled his innovations, leading to developments that enhance production efficiency and product reliability in the industry.

Conclusion

In conclusion, Nobuyuki Akiyama stands out as a pioneering inventor whose patents in thin film technology have significantly impacted semiconductor manufacturing. His contributions continue to propel advancements in the field, showcasing the vital role of innovation in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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