The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 1990
Filed:
Feb. 04, 1988
Hiroshi Yamaguchi, Fujisawa, JP;
Keiya Saito, Yokohama, JP;
Akira Shimase, Yokohama, JP;
Satoshi Haraichi, Yokohama, JP;
Susumu Aiuchi, Yokohama, JP;
Nobuyuki Akiyama, Yokohama, JP;
Shinji Kuniyoshi, Tokyo, JP;
Takeshi Kimura, Higashimurayama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of correcting a circuit pattern such as an X-ray mask, carried out by first preparing a circuit pattern structure where a circuit pattern on a conductive film is coated with a protective film, then forming a hole or a slit by irradiating a high-intensity focused ion beam to a dropout defective portion in the circuit pattern of the circuit pattern structure, and plating such hole or slit while utilizing the conductive film as a plating electrode, thereby forming a metal frame to correct the dropout defective portion.