Yokohama, Japan

Nobumasa Suzuki

This inventor holds 31 USPTO granted patents, primarily in Plasma Processing Technology. Top assignees: Canon Kabushiki Kaisha, Canon Anelva Corporation, Other. Active years: 1993-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobumasa Suzuki. Retrieved from https://idiyas.com/inventor/nobumasa-suzuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 83.9

Average Co-Inventor Count = 1.6

ph-index = 11

Forward Citations = 359(Granted Patents)


Location History:

  • Sendai, JP (1998)
  • Utsunomiya, JP (2003 - 2004)
  • Kanagawa, JP (2004 - 2005)
  • Ibaraki, JP (2005)
  • Tochigi, JP (2005)
  • Yokohama, JP (1993 - 2011)

Company Filing History:


Years Active: 1993-2011

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Areas of Expertise:
Dielectric Films
Plasma Processing
Laser Oscillation
Thin Film Formation
Microwave Applicator
Chemical Vapor Deposition
Optical Recording Medium
Surface Modification
Photo-Excited Processing
Microwave Plasma Etching
Device Fabrication
Semiconductor Manufacturing
31 patents (USPTO):Explore Patents

Title: Nobumasa Suzuki: Innovator in Dielectric Films and Electron Sources

Introduction: Nobumasa Suzuki, a distinguished inventor hailing from Yokohama, Japan, holds an impressive portfolio of 31 patents. His work primarily focuses on advancements in dielectric films and electron-emitting devices, reflecting a significant impact in the fields of materials science and electronics.

Latest Patents: Among his latest innovations is a patent for a process for forming dielectric films. This process involves the creation of films containing metal atoms, silicon atoms, and oxygen atoms on silicon substrates through a series of meticulously designed steps. The initial step requires oxidizing the silicon substrate to create a silicon dioxide film, followed by the formation of a metal film in a non-oxidizing atmosphere. Subsequent heating and oxidation steps allow for the diffusion of metal atoms into the silicon dioxide film, ultimately culminating in films with enhanced properties.

Another notable patent is for an electron source and image display apparatus. This design features multiple electron-emitting devices linked to a matrix wiring system of scan and modulation lines on a substrate. Each device integrates a comb-like structure for the cathode and gate electrodes, optimizing the electric potential applied to various electron-emitting members. This innovation seeks to improve the efficiency and performance of electronic displays.

Career Highlights: Nobumasa Suzuki has made significant contributions throughout his career, including his work with Canon Kabushiki Kaisha, a renowned multinational corporation known for its imaging and optical products. His experience in such a prestigious company has undoubtedly enriched his expertise in innovation and technology development.

Collaborations: Throughout his career, Suzuki has collaborated with notable figures such as Hideo Kitagawa and Hiroshi Ohsawa. These professional relationships have facilitated the exchange of ideas, enhancing the development of innovative technologies within the electronic and materials engineering fields.

Conclusion: Nobumasa Suzuki's dedication to innovation is evident through his extensive patent portfolio and significant contributions to technology. His work on dielectric films and electron sources not only showcases his inventive capabilities but also illustrates his role in advancing electronic materials. As technology continues to evolve, Suzuki's innovations will likely play a crucial role in shaping the future of electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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