The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Oct. 27, 2000
Applicant:
Inventors:
Nobumasa Suzuki, Yokohama, JP;
Shigenobu Yokoshima, Ohta-ku, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ; H01L 2/100 ;
U.S. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ; H01L 2/100 ;
Abstract
In order to keep the balance of microwave plasma density to suppress uneven processing in the circumferential direction of a circular waveguide, in a plasma processing apparatus comprising a plasma generation chamber, a support means for supporting an article, a gas introducing means, and an evacuation means, two introducing ports are provided in a microwave applicator for supplying microwaves through a dielectric window, and microwaves distributed with a junction circuit are guided to the introducing ports such that electric field vectors are in predetermined directions.