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For the Inventor, By the Inventor

Tochigi, Japan

Shigenobu Yokoshima

This inventor holds 3 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 2002-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigenobu Yokoshima. Retrieved from https://idiyas.com/inventor/shigenobu-yokoshima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3

% Patents Active = 66.7

Average Co-Inventor Count = 1.5

ph-index = 3

Forward Citations = 48(Granted Patents)


Location History:

  • Utsunomiya, JP (2002)
  • Ohta-ku, JP (2003)
  • Tochigi, JP (2005)

Company Filing History:

goldMedal3 out of 92,901 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2002-2005

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3 patents (USPTO):Explore Patents
1. 6870123 - Microwave applicator, plasma processing apparatus having same, and plasma processing method (2005-03-22),
2. 6652709 - Plasma processing apparatus having circular waveguide, and plasma processing method (2003-11-25),
3. 6417080 - Method of processing residue of ion implanted photoresist, and method of producing semiconductor device (2002-07-09),

Title: Shigenobu Yokoshima: Innovator in Plasma Processing Technology

Introduction

Shigenobu Yokoshima is a notable inventor based in Tochigi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on improving the controllability of microwave applications in various processing methods.

Latest Patents

Yokoshima's latest patents include a microwave applicator, a plasma processing apparatus, and a plasma processing method. The microwave applicator is designed to enhance the radiation characteristics of microwaves, thereby improving the controllability of processing in both radial and circumferential directions of an article. This innovative applicator features a circular waveguide with multiple slots for microwave radiation, where the centers of these slots are strategically offset to optimize performance.

The plasma processing apparatus aims to maintain a balanced microwave plasma density, which is crucial for preventing uneven processing in the circumferential direction of the circular waveguide. This apparatus includes a plasma generation chamber, a support mechanism for the article, gas introduction means, and evacuation means. It utilizes two introducing ports in the microwave applicator to supply microwaves through a dielectric window, ensuring that the electric field vectors are aligned in predetermined directions for optimal processing.

Career Highlights

Yokoshima is currently associated with Canon Inc., a leading company in imaging and optical products. His work at Canon has allowed him to push the boundaries of plasma processing technology, contributing to advancements in various applications.

Collaborations

One of his notable collaborators is Nobumasa Suzuki, with whom he has worked on various projects related to plasma processing.

Conclusion

Shigenobu Yokoshima's innovative contributions to plasma processing technology have established him as a key figure in the field. His patents reflect a commitment to enhancing microwave applications, which have significant implications for various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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