Ning Zhan

Title: Innovations by Inventor Ning Zhan

Introduction

Ning Zhan is an accomplished inventor based in Scarsdale, NY (US). He holds two patents that showcase his expertise in semiconductor technology and fabrication methods. His work has significantly contributed to advancements in the field.

Latest Patents

Ning Zhan's latest patents include "Techniques for improved removal of sacrificial mask" and "Fin-type metal-semiconductor resistors and fabrication methods thereof." The first patent describes a method involving the formation of a sacrificial mask made of carbon-based material, etching memory structures, and selectively removing the mask at temperatures below 350°C. The second patent outlines fabrication methods for semiconductor devices, including the implantation of dopants to modulate physical properties and the formation of source and drain contacts.

Career Highlights

Throughout his career, Ning Zhan has worked with notable companies such as GlobalFoundries Inc. and Varian Semiconductor Equipment Associates, Inc. His experience in these organizations has allowed him to refine his skills and contribute to significant technological advancements.

Collaborations

Ning Zhan has collaborated with talented individuals in the field, including Anthony I-Chih Chou and Chengwen Pei. These collaborations have fostered innovation and the sharing of ideas, further enhancing the impact of his work.

Conclusion

Ning Zhan's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative methods continue to influence advancements in the field.