Nilanjan Z Ghosh

Title: Innovations by Nilanjan Z Ghosh

Introduction

Nilanjan Z Ghosh is a prominent inventor based in Chandler, AZ (US). He has made significant contributions to the field of chemical imaging and inspection technologies. With a total of 5 patents, Ghosh's work focuses on enhancing the efficiency and accuracy of various processes in semiconductor manufacturing.

Latest Patents

One of his latest patents involves non-destructive 3-dimensional chemical imaging of photo-resist material. This invention includes devices, systems, and processes that utilize a combined confocal Raman microscope to inspect photo resist film material layers. The technology aims to detect border defects between regions of light exposed and unexposed resist film material. By employing Raman spectroscopy and confocal imaging, this method provides fast, high-resolution, non-destructive in-line inspection, which significantly improves the technical development of polymerization profiles of the resist film material.

Another notable patent focuses on inline inspection of the contact between conductive traces and substrates for hidden defects. This invention uses a white light interferometer (WLI) microscope with a tilted objective lens to monitor resist footing defects and conductive trace undercut defects. The WLI microscope allows for high-throughput and low-cost metrology, enabling non-destructive, non-contact, in-line monitoring of defects that would otherwise remain hidden.

Career Highlights

Nilanjan Z Ghosh is currently employed at Intel Corporation, where he continues to innovate and develop advanced technologies. His work has been instrumental in improving inspection processes within the semiconductor industry.

Collaborations

Ghosh has collaborated with notable coworkers, including Zhiyong Wang and Shuhong Liu, contributing to various projects and advancements in their field.

Conclusion

Nilanjan Z Ghosh's innovative patents and contributions to chemical imaging and inspection technologies have made a significant impact in the semiconductor industry. His work continues to pave the way for advancements in non-destructive testing and quality assurance processes.