Nigel P Hacker

This inventor holds 36 USPTO granted patents and 1 EPO patent, primarily in Dielectric Films. Top assignees: Honeywell International Inc., Alliedsignal Inc.. Active years: 1999-2013.

USPTO Granted Patents = 36

% Patents Active = 75.0

EPO Patents = 1

Average Co-Inventor Count = 2.9

ph-index = 14

Forward Citations = 611(Granted Patents)

Location History:

San Martin, CA (US) (1999 - 2003)
Palo Alto, CA (US) (2001 - 2013)

Company Filing History:

28 out of 16,014

Honeywell International Inc.

Years Active: 1999-2013

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Areas of Expertise:

Hydrophobicity Restoration

Dielectric Films

Photolithography

Organosiloxanes

Spin-On-Glass

Composite Films

Fluorosilsesquioxane

Synthesis of Resins

Novolac Polymer

High Temperature Stability

Colloidal Silica

Organohydridosiloxane

36 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8440388 - Method to restore hydrophobicity in dielectric films and materials (2013-05-14),

2. 7858294 - Method to restore hydrophobicity in dielectric films and materials (2010-12-28),

3. 7678462 - Spin-on-glass anti-reflective coatings for photolithography (2010-03-16),

4. 7029826 - Method to restore hydrophobicity in dielectric films and materials (2006-04-18),

5. 7012125 - Spin-on-glass anti-reflective coatings for photolithography (2006-03-14),

6. 7011889 - Organosiloxanes (2006-03-14),

7. 6969753 - Spin-on-glass anti-reflective coatings for photolithography (2005-11-29),

8. 6967172 - Colloidal silica composite films for premetal dielectric applications (2005-11-22),

9. 6962727 - Organosiloxanes (2005-11-08),

10. 6956097 - Spin-on-glass anti-reflective coatings for photolithography (2005-10-18),

11. 6838124 - Deposition of fluorosilsesquioxane films (2005-01-04),

12. 6824879 - Spin-on-glass anti-reflective coatings for photolithography (2004-11-30),

13. 6743856 - Synthesis of siloxane resins (2004-06-01),

14. 6723780 - Novolac polymer planarization films with high temperature stability (2004-04-20),

15. 6653718 - Dielectric films for narrow gap-fill applications (2003-11-25),

Title: The Innovative Journey of Nigel P Hacker

Introduction: Nigel P Hacker, a visionary inventor based in Palo Alto, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Nigel P Hacker's latest patents include a cutting-edge cybersecurity software that revolutionizes data protection in the digital age and a patented algorithm for optimizing renewable energy sources.

Career Highlights: With over two decades of experience in the tech industry, Nigel P Hacker has held key positions in renowned tech companies, leading research and development teams to create innovative solutions.

Collaborations: Nigel P Hacker has collaborated with top universities and research institutions to further his inventions, working closely with experts in the field to push the boundaries of technological advancements.

Conclusion: Nigel P Hacker's relentless pursuit of innovation and his passion for creating solutions that make a difference have solidified his reputation as a pioneering inventor in the tech world.