The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2005
Filed:
Nov. 19, 2002
Teresa Baldwin, Fremont, CA (US);
Joseph Kennedy, San Jose, CA (US);
Nigel Hacker, Palo Alto, CA (US);
Richard Spear, Portland, OR (US);
Teresa Baldwin, Fremont, CA (US);
Joseph Kennedy, San Jose, CA (US);
Nigel Hacker, Palo Alto, CA (US);
Richard Spear, Portland, OR (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.