Nicolas Sousbie

Title: Nicolas Sousbie: Innovator in Semiconductor Technology

Introduction

Nicolas Sousbie is a prominent inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative approaches have advanced the processes involved in semiconductor manufacturing.

Latest Patents

One of his latest patents is a surface roughening process. This process involves forming a rough interface in a semiconductor substrate. It includes steps such as depositing a material on the substrate's surface, creating a zone of irregularities in the material, and thermally oxidizing the material to form a rough interface in the semiconductor substrate. Additionally, the oxidized material's surface may be prepared for assembly with a second substrate.

Another notable patent is an annealing process for structures that include at least one wafer. This process entails conducting a first annealing in an oxidizing atmosphere while holding the structure in contact with a holder. The structure is then shifted to expose non-oxidized regions for a second annealing, ultimately providing an oxide layer on the structure.

Career Highlights

Nicolas Sousbie has worked with several notable companies in the semiconductor industry, including Soitec and S.O.I.TEC Silicon on Insulator Technologies. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Nicolas has collaborated with esteemed colleagues such as Bernard Aspar and Chrystelle Lagahe Blanchard. These partnerships have fostered a creative environment that has led to innovative solutions in the field.

Conclusion

Nicolas Sousbie's work in semiconductor technology exemplifies the spirit of innovation. His patents and collaborations have significantly impacted the industry, showcasing his dedication to advancing technology.