The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Jan. 21, 2011
Nicolas Sousbie, Grenoble, FR;
Bernard Aspar, St. Ismier, FR;
Thierry Barge, Chevrieres, FR;
Chrystelle Lagahe Blanchard, Crolles, FR;
Nicolas Sousbie, Grenoble, FR;
Bernard Aspar, St. Ismier, FR;
Thierry Barge, Chevrieres, FR;
Chrystelle Lagahe Blanchard, Crolles, FR;
Soitec, Bernin, FR;
Abstract
The invention relates to a process for annealing a structure that includes at least one wafer, with the annealing process including conducting a first annealing of the structure in an oxidizing atmosphere while holding the structure in contact with a holder in a first position in order to oxidize at least portion of the exposed surface of the structure, shifting the structure on the holder into a second position in which non-oxidized regions of the structure are exposed, and conducting a second annealing of the structure in an oxidizing atmosphere while holding the structure in the second position. The process provides an oxide layer on the structure.