The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Jul. 13, 2007
Bernard Aspar, Rives, FR;
Chrystelle Lagahe Blanchard, Saint Joseph de Riviere, FR;
Nicolas Sousbie, Grenoble, FR;
Bernard Aspar, Rives, FR;
Chrystelle Lagahe Blanchard, Saint Joseph de Riviere, FR;
Nicolas Sousbie, Grenoble, FR;
S.O.I.TEC Silicon on Insulator Technologies, Bernin, FR;
Abstract
The invention provides a method for forming a semiconductor component with a rough buried interface. The method includes providing a first semiconductor substrate having a first surface of roughness R. The method further includes thermally oxidizing the first surface of the first semiconductor substrate to form an oxide layer defining an external oxide surface on the first semiconductor substrate and a buried oxide-semiconductor interface below the oxide surface, so that the buried oxide surface has a roughness Rthat is less than R. The method also includes assembling the oxide surface of the first semiconductor substrate with a second substrate. The invention also provides a component formed according to the method of the invention.