The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Jul. 13, 2007
Bernard Aspar, Rives, FR;
Chrystelle Lagahe Blanchard, Saint Joseph de Riviere, FR;
Nicolas Sousbie, Grenoble, FR;
Bernard Aspar, Rives, FR;
Chrystelle Lagahe Blanchard, Saint Joseph de Riviere, FR;
Nicolas Sousbie, Grenoble, FR;
S.O.I.TEC Silicon on Insulator Technologies, Bernin, FR;
Abstract
A process of forming a rough interface in a semiconductor substrate. The process includes the steps of depositing a material on a surface of the substrate, forming a zone of irregularities in the material, and forming a rough interface in the semiconductor substrate by a thermal oxidation of the material and a part of the substrate. Additionally, the surface of the oxidized material may be prepared and the surface may be assembled with a second substrate.