Fishkill, NY, United States of America

Neena Garg


Average Co-Inventor Count = 7.2

ph-index = 3

Forward Citations = 65(Granted Patents)


Company Filing History:


Years Active: 2002-2009

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Neena Garg: A Pioneer in Semiconductor Technology

Introduction

Neena Garg, an accomplished inventor based in Fishkill, NY, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of seven patents, Garg has established herself as a leading figure in innovations that enhance semiconductor-on-insulator (SOI) substrates and their performance.

Latest Patents

Two of Garg's latest patents are noteworthy. The first is titled "Control of Buried Oxide in SIMOX." This patent describes a method for forming a semiconductor-on-insulator substrate, which includes the steps of heating a substrate, implanting oxygen into this heated substrate, cooling it, and then annealing. This innovative process improves the quality of buried oxide regions, addressing issues like surface roughness, uniform thickness, and breakdown voltage.

The second patent, "Divot Reduction in SIMOX Layers," presents a method for fabricating silicon-on-insulator substrates with reduced defects. By implanting oxygen ions into a silicon-containing substrate and annealing it under specific conditions, this invention helps create a buried oxide region that properly isolates layers within the substrate. The method also minimizes tile and divot defects, thereby enhancing the optical detection of other lower-density defects.

Career Highlights

Neena Garg is currently employed at International Business Machines Corporation (IBM), a pioneering technology and consulting company. Her work continues to push the boundaries of semiconductor technology, focusing on innovations that foster enhanced performance and reliability in electronic devices.

Collaborations

Throughout her career, Garg has collaborated with notable peers, including Kenneth John Giewont and Junedong Lee. These partnerships have allowed her to expand her research capabilities and advance her inventiveness in semiconductor development.

Conclusion

Neena Garg's impressive body of work and numerous patents underscore her important role in the advancement of semiconductor technology. Her innovative approaches address critical challenges in the field and illustrate her commitment to improving electronic materials. As she continues her work at IBM, Garg is poised to make even greater strides in the realm of innovations and inventions.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…