For the Inventor, By the Inventor

Enter inventor name

Newark, DE, United States of America

Naresh Kumar Penta

USPTO Granted Patents = 14 (Patent Applications = 2)

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 13(Granted Patents)

Company Filing History:

Rohm and Haas Electronic Materials Cmp Holdings, Inc.

Nitta Haas Inc.

where one patent can have more than one assignee

Years Active: 2014-2021

Loading Chart...

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11186748 - Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them (2021-11-30),

2. 10954411 - Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide (2021-03-23),

3. 10822524 - Aqueous compositions of low dishing silica particles for polysilicon polishing (2020-11-03),

4. 10787592 - Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment (2020-09-29),

5. 10711158 - Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them (2020-07-14),

6. 10626298 - Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon (2020-04-21),

7. 10584265 - Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them (2020-03-10),

8. 10508221 - Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them (2019-12-17),

9. 10316218 - Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them (2019-06-11),

10. 10221336 - Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them (2019-03-05),

11. 10119048 - Low-abrasive CMP slurry compositions with tunable selectivity (2018-11-06),

12. 9150759 - Chemical mechanical polishing composition for polishing silicon wafers and related methods (2015-10-06),

13. 8801959 - Stable, concentratable silicon wafer polishing composition and related methods (2014-08-12),

14. 8795548 - Silicon wafer polishing composition and related methods (2014-08-05),

Title: Naresh Kumar Penta - Innovative Inventor from Newark

Introduction: Naresh Kumar Penta is a talented inventor based in Newark, DE, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Naresh Kumar Penta holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his diverse range of expertise and creativity.

Career Highlights: With a career spanning over two decades, Naresh Kumar Penta has worked with leading tech companies, research institutions, and universities, consistently pushing the boundaries of what is possible in the world of invention.

Collaborations: Throughout his career, Naresh Kumar Penta has collaborated with top engineers, scientists, and researchers from around the globe, fostering a culture of innovation and excellence in all his projects.

Conclusion: Naresh Kumar Penta's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs, making him a true pioneer in the world of technology.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Loading…