This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignees: Fujitsu Corporation, Fujitsu Microelectronics Limited, Fujitsu Semiconductor Limited. Active years: 2002-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2002-2011
Title: Naoyuki Ishiwata: Innovator in Semiconductor Technology
Introduction
Naoyuki Ishiwata is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative work has paved the way for advancements in manufacturing processes and photomask technology.
Latest Patents
Ishiwata's latest patents include a photomask and a method for manufacturing a semiconductor device using the photomask. This method involves a first exposing step using a photomask in a first area of a semiconductor substrate, followed by a second exposing step in an adjacent area. The photomask features a first transmitting pattern with a ring shape that is missing a part, along with a supplemental second transmitting pattern that corresponds to the missing part. This design allows for a closed loop pattern to be exposed on the semiconductor substrate.
Another notable patent is a photomask fabrication method that prevents patterns outside a chip region from being transferred onto a wafer. This innovation includes a non-circuit pattern formed by openings in a phase shift layer, which is strategically located around the chip region. This design minimizes the risk of non-circuit patterns being transferred onto the wafer due to flare influence.
Career Highlights
Throughout his career, Naoyuki Ishiwata has worked with leading companies in the semiconductor industry, including Fujitsu Corporation and Fujitsu Microelectronics Limited. His experience in these organizations has contributed to his expertise in photomask technology and semiconductor device fabrication.
Collaborations
Ishiwata has collaborated with notable professionals in the field, including Eiichi Hoshino and Masanori Onodera. These collaborations have further enhanced his innovative capabilities and have led to the development of advanced semiconductor technologies.
Conclusion
Naoyuki Ishiwata's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the manufacturing processes of semiconductor devices, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile