The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Dec. 21, 2004
Naoyuki Ishiwata, Kawasaki, JP;
Koji Hosono, Kawasaki, JP;
Naoyuki Ishiwata, Kawasaki, JP;
Koji Hosono, Kawasaki, JP;
Fujitsu Microelectronics Limited, Yokohama, JP;
Abstract
There is provided a method of manufacturing a mask for exposure, which is capable of measuring the phase difference between a shifter portion and a non-shifter portion with good accuracy. A mask for exposure having: two first light-shielding device patterns, which are formed on a quartz substrate (transparent substrate) in a device region at a first gap and extend over a first concave portion; a second device light-shielding pattern at a second gap from the first device light-shielding pattern; two first light-shielding monitor patterns, which are formed on the quartz substrate in a monitor region at a third gap wider than the first gap and extend over a second concave portion; and second light-shielding monitor pattern, which has a fourth gap wider than the second gap from the first light-shielding monitor pattern, in which the size of the first light-shielding monitor pattern is equal to or less than the size of the first light-shielding device pattern.