The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
Feb. 04, 2008
Naoyuki Ishiwata, Kawasaki, JP;
Naoyuki Ishiwata, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A method of manufacturing a semiconductor device that includes: a first exposing step using a photomask in a first area of a semiconductor substrate; and a second exposing step using the photomask in a second area adjacent to the first area of the semiconductor substrate. The photomask includes a first transmitting pattern having a ring shape that is missing a part, and a supplemental second transmitting pattern having a shape corresponding to the missing part of the first transmitting pattern, so that a closed loop pattern is exposed by the first exposing step and the second exposing step on the semiconductor substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile